首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
基材处理室用的套组和靶材
摘要
申请公布号
TWI435941
申请公布日期
2014.05.01
申请号
TW095140305
申请日期
2006.10.31
申请人
应用材料股份有限公司 美国
发明人
史奇宝凯萨琳;法兰干麦可艾伦;良土芽吾一;艾伦阿道夫米勒;帕夫洛夫克里斯多福
分类号
C23C14/00
主分类号
C23C14/00
代理机构
代理人
蔡坤财 台北市中山区松江路148号11楼;李世章 台北市中山区松江路148号11楼
主权项
地址
美国
您可能感兴趣的专利
BRUSH INCLUDING SURFACE TREATMENT ABRASIVE AND FIXING JIG THEREFOR
LOWER ARM OF VEHICLE
ROTATIONAL RATIO VARYING DEVICE OF STEERING SYSTEM
METHOD FOR FABRICATING ULTRA-FINE PATTERN USING BOTTOM ANTI-REFLECTIVE COATING INCLUDING PHOTO ACID GENERATOR
BALANCE APPARATUS OF ENGINE
METHOD FOR MEASURING ENGINE COMBUSTION PRESSURE
METHOD FOR FABRICATING PATTERN OF SEMICONDUCTOR DEVICE
METHOD FOR BIOLOGICAL CONTROL OF PLANT DISEASES USING CHAETOMIUM GLOBOSUM F0142 AND CHAETOVIRIDINS A AND B PRODUCED BY THE SAME
COMPLEX PANEL MADE OF SYNTHETIC RESINS
PAD STRUCTURE OF SEAT BACK FOR ACTIVE HEADREST OF VEHICLE
RETAINING WALL BLOCK AND COUPLING STRUCTURE WITH ANCHOR
METHOD FOR TERMINATING NETWORK MARKETING
FOIL JOURNAL BEARING
DAMPING APPARATUS OF CHAIN GUIDE
DEVICE FOR EXCHANGING INTERNAL HEARTH ROLL OF ANNEALING FURNACE
DEVICE FOR RECOVERING SWARF IN FILTRATION FACILITY
SLAG COATING METHOD DURING CONVERTER TAPPING
METHOD FOR FABRICATING SOURCE/DRAIN OF SEMICONDUCTOR DEVICE
METHOD FOR FORMING PATTERN USING ARF EXPOSURE SOURCE
METHOD FOR FORMING PATTERN USING ARF EXPOSURE SOURCE
