发明名称 |
STRUCTURES AND METHODS FOR DETERMINING TDDB RELIABILITY AT REDUCED SPACINGS USING THE STRUCTURES |
摘要 |
A structure for TDDB measurement, a method determining TDDB at reduced spacings. The structure includes an upper dielectric layer on a top surface of a lower dielectric layer, a bottom surface of the upper dielectric layer and the top surface of the lower dielectric layer defining an interface; a first wire formed in the lower dielectric layer; a second wire formed in the upper dielectric layer; and wherein a distance between the first wire and the second wire measured in a direction parallel to the interface is below the lithographic resolution limit of the fabrication technology. |
申请公布号 |
US2014118020(A1) |
申请公布日期 |
2014.05.01 |
申请号 |
US201213664903 |
申请日期 |
2012.10.31 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
FILIPPI RONALD G.;KALTALIOGLU ERDEM;LUSTIG NAFTALI E.;WANG PING-CHUAN;ZHANG LIJUAN |
分类号 |
G01R31/26;H01L23/48 |
主分类号 |
G01R31/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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