发明名称 SEMICONDUCTOR DEVICE WITH BURIED GATE AND METHOD FOR FABRICATING THE SAME
摘要 A semiconductor device includes buried gates formed over a substrate, storage node contact plugs which are formed over the substrate and include a pillar pattern and a line pattern disposed over the pillar pattern, and a bit line structure which is formed over the substrate and isolates adjacent ones of the storage node contact plugs from each other.
申请公布号 US2014120710(A1) 申请公布日期 2014.05.01
申请号 US201414149498 申请日期 2014.01.07
申请人 SK HYNIX INC. 发明人 SHIN JONG-HAN;PARK BO-MIN
分类号 H01L21/768;H01L21/28 主分类号 H01L21/768
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