EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a technique which is advantageous for reducing a deviation between the position of a substrate stage and a target position.SOLUTION: The exposure apparatus which exposes a substrate includes: a stage which moves while holding the substrate; a stage control system which controls the stage according to an instruction value; a specification section which detects an exposure light to be irradiated to the substrate and specifies an exposure start time at which exposure to the substrate is started; and a main control system which calculates the positions of the stage at a plurality of times in the exposure period of the substrate on the basis of position information on the stage at the exposure start time specified by the specification section, finds an average position of the stage in at least some periods of the exposure period on the basis of the calculated position of the stage at the plurality of times, and gives an instruction value to match the average position of the stage to a target position to the stage control system.