STRIPPING AND CLEANING COMPOSITIONS FOR REMOVAL OF THICK FILM RESIST

摘要

PROBLEM TO BE SOLVED: To provide stripping and cleaning compositions suitable for removal of a film resist.SOLUTION: Stripping and cleaning compositions suitable for removal of film resists include about 2-55 wt.% of at least one alkanolamine or at least one morpholine or mixtures thereof, about 20-94 wt.% of at least one organic solvent, and about 0.5-60 wt.% of water, based on the total weight of the composition.