METHOD AND APPARATUS FOR MEASURING THIN FILM THICKNESS USING X-RAY

摘要

Provided is an apparatus and method for measuring for measuring a thickness of thin film using x-ray where a thickness of a thin film of nanometer(nm)-level can be accurately measured without destructing an target sample, through determination of thickness of thin film of the target sample, by determining a calibration curve by comparing a difference of intensities of signals scattered by a special component included in a base layer of the reference sample having a base layer and a base layer formed with the thin film layer with a thickness of the thin film layer, and determining the thickness of thin film layer of the target sample by comparing a difference of intensities of signals scattered by the special component included in the base layer of the target sample having the base layer formed with the thin film layer with the reference sample having the base layer with the calibration curve.