发明名称 CAPACITOR AND SEMICONDUCTOR DEVICE USING SAME
摘要 A capacitor for a semiconductor device includes a bottom electrode plate, an insulating layer formed on the bottom electrode plate, and a top electrode plate formed on the insulating layer. The bottom plate includes a capacitor well and at least one diffused region formed on the capacitor well. A doping concentration of the at least one diffused region is higher than a doping concentration of the capacitor well, the capacitor well comprising a first well.
申请公布号 US2014117499(A1) 申请公布日期 2014.05.01
申请号 US201314049269 申请日期 2013.10.09
申请人 FITIPOWER INTEGRATED TECHNOLOGY, INC. 发明人 YANG CHUN-PING;ZHANG DA-PONG
分类号 H01L29/92 主分类号 H01L29/92
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