发明名称 Metal-Oxide-Semiconductor Field-Effect Transistor with Spacer over Gate
摘要 A metal-oxide-semiconductor field-effect transistor (MOSFET) includes a substrate, a source and a drain in the substrate, a gate electrode disposed over the substrate between the source and drain. An inner spacer is disposed at least partially over the gate electrode. An outer spacer is disposed adjacent to a sidewall of the gate electrode.
申请公布号 US2014117467(A1) 申请公布日期 2014.05.01
申请号 US201213660728 申请日期 2012.10.25
申请人 MANUFACTURING COMPANY, LTD. TAIWAN SEMICONDUCTOR;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 YANG CHUNG-YUAN;WANG JEN-PAN
分类号 H01L29/78;H01L21/336 主分类号 H01L29/78
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