| 发明名称 |
HARD MASK COMPOSITION AND METHOD FOR FORMING PATTERN USING SAME |
| 摘要 |
The present invention relates to a hard mask composition and a method for forming a pattern using same, . tThe hard mask composition comprising comprises a polymer expressed by formula Formula 1, a monomer expressed by formula Formula 2, and a solvent, wherein the monomer has a higher content than that of the polymer. |
| 申请公布号 |
WO2014065500(A1) |
申请公布日期 |
2014.05.01 |
| 申请号 |
WO2013KR07873 |
申请日期 |
2013.09.02 |
| 申请人 |
CHEIL INDUSTRIES INC. |
发明人 |
LEE, CHUL-HO;PARK, YOU-JUNG;YOON, YONG-WOON;LEE, SUNG-JAE;CHO, YOUN-JIN;KIM, YOUNG-MIN;LEE, CHUNG-HEON |
| 分类号 |
G03F7/004;G03F1/00;G03F7/26 |
主分类号 |
G03F7/004 |
| 代理机构 |
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