发明名称 MANUFACTURING METHOD OF THROUGH ELECTRODE SUBSTRATE
摘要 <p>PROBLEM TO BE SOLVED: To provide a manufacturing method of a through electrode substrate which inhibits the occurence of voids in a conductive part.SOLUTION: In a through electrode substrate manufacturing method according to one embodiment, a through hole penetrating through front and rear surfaces of a substrate is formed, and a mask is disposed on at least the one side of the through hole. A seed layer is formed on the substrate through the mask, and the through hole is filled with a conductive material by an electrolytic plating method which supplies electric power to the seed layer to form a conductive part.</p>
申请公布号 JP2014078720(A) 申请公布日期 2014.05.01
申请号 JP20130234506 申请日期 2013.11.13
申请人 DAINIPPON PRINTING CO LTD 发明人 MAEKAWA SHINJI
分类号 H01L23/32;H01L21/768;H01L23/12;H05K1/11 主分类号 H01L23/32
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