发明名称 |
METHOD FOR PREPARING HIGH-PURITY AU POWDERS USING DRY METHOD |
摘要 |
<p>The present invention relates to a method for preparing high-purity Au powders by applying a dry method (plasma processing) so as to prepare an Au target which is used for a semiconductor. The present invention is characterized in that high-purity Au powders can be prepared through plasma processing in which an ingot applied to plasma is a spent waste target and in granular form. According to the present invention, it is possible to prepare high-purity Au powders in a short time through plasma without post-processing. Au powders are prepared by setting a chamber atmosphere of plasma equipment to a vacuum atmosphere; forming plasma and a melting pool by inputting a certain amount of a waste target and granules and then removing metal impurities having low melting point; removing remaining impurities by means of a reducing gas; and modifying the electrical power of plasma, the amount of plasma gas, and retention time, thereby producing highly pure Au powder.</p> |
申请公布号 |
WO2014065453(A1) |
申请公布日期 |
2014.05.01 |
申请号 |
WO2012KR08955 |
申请日期 |
2012.10.29 |
申请人 |
HEE SUNG METAL LTD. |
发明人 |
LEE, HYO WON;YOON, WON KYU;YANG, SEUNG HO;HONG, GIL SU |
分类号 |
B22F9/14 |
主分类号 |
B22F9/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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