发明名称 METHOD FOR CUTTING A PATCH TO BE APPLIED ONTO A CURVED SUBSTRATE
摘要 The invention relates to a method for cutting a patch to be applied onto a curved substrate (20) that includes the preliminary calculation of curvilinear lengths (I, I, I,...) on the substrate between a reference point (O) and a peripheral edge (B) of said substrate. The calculated lengths are applied to a planar film for making the patch, and then the patch is cut by connecting the ends (C, C, C,...) of the applied lengths. The patch then precisely coincides with the edge of the substrate. Such a method is particularly useful for applying a functional film onto a spectacle lens, as a trimming of the lens after the film is assembled with the lens would degrade said film.
申请公布号 EA019592(B1) 申请公布日期 2014.04.30
申请号 EA20110071134 申请日期 2010.03.15
申请人 ESSILOR INTERNATIONAL (COMPAGNIE GENERALE D'OPTIQUE) 发明人 ALLIONE PASCAL;BEGON CEDRIC;LAVILLONNIERE NICOLAS;LADOUS AGNES
分类号 G02B1/10;G02C7/10 主分类号 G02B1/10
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