IMPROVED LIGHT EXPOSURE SOURCE FOR FORMING PATTERNS, AND EXPOSURE APPARATUS, SYSTEM, AND METHOD FOR FORMING PATTERNS HAVING THE SAME

摘要

Disclosed are an improved light exposure source for forming a pattern, an exposure apparatus, an exposure system, and an exposure method. A light exposure source for forming a pattern according to the present invention includes a light source which outputs a beam; a collimating lens which is provided in the lower part of the light source and collimates the outputted beam in parallel; an axicon lens which is provided in the lower part of the collimating lens and includes a cone surface which forms multi focus in order for the collimated beam to have the same beam size over the focus region; and a prism which is located in the focus region and includes a concave type cone surface corresponding to the cone surface in order to output the beam emitted from the axicon lens as a parallel beam.