发明名称 WET CHEMISTRY PROCESSES FOR FABRICATING A SEMICONDUCTOR DEVICE WITH INCREASED CHANNEL MOBILITY
摘要 Embodiments of a semiconductor device having increased channel mobility and methods of manufacturing thereof are disclosed. In one embodiment, the semiconductor device includes a substrate including a channel region and a gate stack on the substrate over the channel region. The gate stack includes an alkaline earth metal. In one embodiment, the alkaline earth metal is Barium (Ba). In another embodiment, the alkaline earth metal is Strontium (Sr). The alkaline earth metal results in a substantial improvement of the channel mobility of the semiconductor device.
申请公布号 EP2724363(A1) 申请公布日期 2014.04.30
申请号 EP20120741411 申请日期 2012.06.26
申请人 CREE, INC. 发明人 DHAR, SARIT;CHENG, LIN;RYU, SEI-HYUNG;AGARWAL, ANANT, KUMAR;PALMOUR, JOHN, WILLIAMS;MAKI, ERIK;GURGANUS, JASON;LICHTENWALNER, DANIEL, JENNER
分类号 H01L21/28;H01L21/314;H01L21/331;H01L21/336;H01L29/16;H01L29/51 主分类号 H01L21/28
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