METHOD FOR MANUFACTURING PHOTOMASK, PHOTOMASK, METHOD FOR TRANSFERRING PATTERN, AND METHOD FOR MANUFACTURING FLAT PANEL DISPLAY

摘要

PURPOSE: The photomask is provided to reduce a required time of a scanning exposure while transferring the pattern to transferred body. CONSTITUTION: The manufacturing method of the photomask comprises: a process of preparing a photomask blank (100b) in which lower layer film (20) and upper layer film (30) are laminated on the transparent substrate (10); preliminary etching process of an upper layer film etching the upper layer film by using a resist pattern (40p) which is formed on the upper layer film as a mask; lower layer film patterning process forming lower layer film pattern (20p) by etching the upper layer film which is etched with the mask; the upper layer film patterning process forming the upper layer film pattern (30p) with having the resist pattern as the mask. [Reference numerals] (AA) Exposure; (BB) Develop; (CC) Preliminary etching upper membrane; (DD) Patterning lower membrane; (EE) Patterning upper membrane; (FF) Remove registeration pattern; (GG) Side etching