Selectively conductive ceramic coated with a metal material

摘要

The method involves forming a structure (11) made of oxide based ceramic. A portion of the external surface of the structure is exposed to a reduction reaction, to remove oxygen atoms to a predetermined depth in order to make the portion electrically conductive. A metallic material starting from the electrically conductive portion is deposited. The structure and the metallic material are machined, in order to provide the element (10) with an aesthetic finish. Plasma used in plasma etching process is provided with an ionized mixture of hydrogen and neutral gas. An independent claim is included for a ceramic element of a timepiece.