发明名称 Arrangement, useful for carrying gas in a vacuum coating equipment with a vacuum chamber in which a magnetron is arranged on a race track of a magnetic system, where race track is closed, and a racetrack space includes working gas channel
摘要 <p>The arrangement for carrying gas in a vacuum coating equipment with a vacuum chamber in which a magnetron is arranged on a race track of a magnetic system, is claimed. The race track is closed, and a racetrack space includes a working gas channel (13), reactive gas channels (12) and a substrate support (9) on which a substrate is placed. A reactive gas auxiliary channel (28) is arranged in a distance between a target of the magnetron and the substrate support and a projection of one of race track portions. The substrate support is formed as a substrate transfer device. The arrangement for carrying gas in a vacuum coating equipment with a vacuum chamber in which a magnetron is arranged on a race track of a magnetic system, is claimed. The race track is closed, and a racetrack space includes a working gas channel (13), reactive gas channels (12) and a substrate support (9) on which a substrate is placed. A reactive gas auxiliary channel (28) is arranged in a distance between a target of the magnetron and the substrate support and a projection of one of race track portions. The substrate support is formed as a substrate transfer device on which the substrate is transported in a substrate transport direction, and the magnetron extends transverse to the substrate transport device. The magnetron is configured as a rotating magnetron having a target tube (2). The working gas channel is arranged parallel to an axial direction of the tube target with its longitudinal extension. The reactive gas channels with their axial longitudinal extents are arranged in parallel to the axial direction of the tube target and on both sides of the tube target laterally next to the tubular magnetron. The reactive gas auxiliary channel is formed into a first part channel and a second part channel. The first part channel is closer to the substrate transport direction than that of the first race track portion, and the second part channel is closer to the substrate transport direction than that of the first part channel. The two sub channels of the reactive gas auxiliary channel are combined to form a double channel. The first and second part channels are arranged one above the other in the target-substrate direction. The reactive gas auxiliary channel is integrally formed. Adjusting devices are arranged to adjust the flow in the reactive gas channel and the reactive auxiliary channels formed separately from each other. A unit is provided for separate measurement of the emission spectrum in the substrate transport direction of the first race track portion and in the substrate transport direction of a second race track portion. A reactive gas auxiliary channels control unit is arranged to control the ratio of reactive gas flow in the reactive gas channels.</p>
申请公布号 DE102012110264(A1) 申请公布日期 2014.04.30
申请号 DE201210110264 申请日期 2012.10.26
申请人 VON ARDENNE ANLAGENTECHNIK GMBH 发明人 LINSS, VOLKER
分类号 C23C14/35;C23C14/54;C23C14/56 主分类号 C23C14/35
代理机构 代理人
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