发明名称 MEMS FIXED CAPACITOR COMPRISING A GAS-CONTAINING GAP AND PROCESS FOR MANUFACTURING SAID CAPACITOR
摘要 The MEMS fixed capacitor (1) comprises a bottom metal electrode (3) formed onto a substrate (S), a top metal electrode (2) supported by metal pillars (5) above the bottom metal electrode, and a gas-containing gap (4) forming a non-solid dielectric layer between said top (2) and bottom (3) metal electrodes ; the distance (D) between the top (2) and bottom (3) metal electrodes is not more than 1µm and the thickness (E) of the top metal electrode (2) is not less than 1µm.
申请公布号 EP2725595(A1) 申请公布日期 2014.04.30
申请号 EP20120306326 申请日期 2012.10.25
申请人 DELFMEMS 发明人 PAVAGEAU, CHRISTOPHE
分类号 H01G5/16;H01G5/18 主分类号 H01G5/16
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