| 摘要 |
An imprint apparatus, which performs an imprint process for forming a pattern of a mold on a resin coated on a substrate, includes an imaging unit configured to image the resin on which the pattern is formed, and a controller configured to control the imprint process. When the pattern is continuously formed on the substrate, the controller compares an image of at least a partial area imaged by the imaging unit and an image of a reference state, which is obtained in advance, and when patterns each having a difference, which falls outside an allowable range, between the images are continuously formed, it determines a transfer error. |
