Optical system for microlithographic projection exposure system that is utilized for manufacturing of e.g. integrated switching circuits, has light sources for illuminating reflecting surfaces with light of different polarization states

摘要

The system has a mirror assembly formed from a set of independently adjustable mirror elements. A beam-deflecting arrangement (10) comprises a group of reflecting surfaces (11, 12), where light generated by two light sources (1, 2) e.g. idle electron lasers and synchrotrons, is guided on the mirror assembly over the group of reflecting surfaces. The two light sources illuminate the group of reflecting surfaces with the light of different polarization states during operation of the system. The group of reflecting surfaces is designed as a strip mirror unit. An independent claim is also included for a method for microlithographic manufacturing of microstructured components.