发明名称 SUBSTRATE FOR GROWTH OF NITRIDE SEMICONDUCTOR
摘要 <p>A substrate for growth of nitride semiconductor capable of obtaining a high-quality nitride semiconductor crystal layer is provided. A substrate for growth of nitride semiconductor for growth of a nitride semiconductor layer on a sapphire substrate (1) according to one embodiment of the invention is provided with an Al 2 O 3 layer (2) as separately provided on the sapphire substrate (1), an AlON layer (3) which is the first layer, and an AlN layer (4) which is the second layer. With respect to the first layer and the second layer, the AlON layer (3) and the AlN layer (4) are deposited on the Al 2 O 3 layer (2) in this order.</p>
申请公布号 EP1655766(B1) 申请公布日期 2014.04.30
申请号 EP20040771524 申请日期 2004.08.11
申请人 NIPPON TELEGRAPH AND TELEPHONE CORPORATION 发明人 KUMAKURA, KAZUHIDE;HIROKI, MASANOBU;MAKIMOTO, TOSHIKI
分类号 H01L21/20;C30B25/18;C30B29/40 主分类号 H01L21/20
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