Optical system for use in illuminating device illuminating reticle in microlithographic projection exposure system to manufacture e.g. LCDs, has deflection device including reflection surfaces upstream and downstream of mirror arrangement

摘要

The system has a mirror arrangement (200) including mirror elements (200a-200c) adjustable independent of each other for changing an angle distribution of light reflected by the mirror arrangement. An overlapping degree between polarization-affecting components (101-103) e.g. Lambda/2-plates, of a polarization-affecting optical arrangement (100) and the mirror arrangement is variably adjustable by displacing the components. A deflection device (300) e.g. prism, includes reflection surfaces (300a, 300b) upstream and downstream of the mirror arrangement relative to a light propagation direction. The mirror arrangement is a micro mirror array. An independent claim is also included for a method for microlithographic manufacturing of microstructured components.