| 摘要 |
PURPOSE: An apparatus for etching a glass substrate is provided to evenly etch the surface of a glass substrate by preventing a nozzle from being clogged in making etchant fall freely on the surface of the glass substrate. CONSTITUTION: An apparatus for etching a glass substrate comprises a cassette (100) and a discharging unit for etchant (200). The cassette contains a plurality of glass substrates (10) which can be transferred in the planar direction of the glass substrates. The discharging unit for etchant placed above the cassette makes etchant fall freely through discharge holes (210). The etchant falls freely through the discharge holes with confining walls in the middle of the discharging unit for etchant. The discharge holes are arranged in a rectangular form and oriented parallel to the transfer direction of the glass substrate. The discharge holes are in an elliptical or octagonal shape. [Reference numerals] (AA) Transfer direction |
