Method and system of pulsed-pressure chemical vapor deposition

摘要

595057 Disclosed is a method for depositing a conformal coating comprising titania or alumina on complex three dimensional metallic substrate surfaces by pulsed-pressure metal-organic chemical vapour deposition (pp-MOCVD), the method comprising: a) placing the substrate article into a pp-MOCVD chamber; b) heating the substrate article in an evacuated pp-MOVCD chamber to a predetermined temperature via induction heating; c) setting precursor pulse parameters to predetermined levels; and d) activating at least one deposition cycle to deposit the coating on the substrate article surfaces. Also disclosed is an apparatus when used for depositing a conformal coating comprising titania or alumina on complex three dimensional metallic substrate surfaces by pulsed-pressure metalorganic chemical vapour deposition (pp-MOCVD), the apparatus comprising means to heat the substrate by induction