发明名称 Illumination apparatus for microlithography projection system including polarization-modulating optical element
摘要 A polarization-modulating optical element consisting of an optically active crystal material has a thickness profile where the thickness, as measured in the direction of the optical axis, varies over the area of the optical element. The polarization-modulating optical element has the effect that the plane of oscillation of a first linearly polarized light ray and the plane of oscillation of a second linearly polarized light ray are rotated, respectively, by a first angle of rotation and a second angle of rotation, with the first angle of rotation and the second angle of rotation being different from each other.
申请公布号 US8711479(B2) 申请公布日期 2014.04.29
申请号 US201313800607 申请日期 2013.03.13
申请人 CARL ZEISS SMT GMBH 发明人 FIOLKA DAMIAN;DEGUENTHER MARKUS
分类号 G02B5/30;G02B1/08;G02B27/28;G02F1/01;G03F7/20 主分类号 G02B5/30
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