发明名称 |
Masking method and apparatus |
摘要 |
A chamber for combinatorially processing a substrate is provided. The chamber includes a first mask and a second mask that share a common central axis. The first mask and the second mask are independently rotatable around the common central axis. The first mask has a first plurality of radial apertures and the second mask has a second plurality of radial apertures. An axis of the first plurality of radial apertures is offset from an axis of the second plurality of radial apertures. A substrate support that is operable to support a substrate below the first and second masks is included. The substrate support shares the common central axis. |
申请公布号 |
US8709270(B2) |
申请公布日期 |
2014.04.29 |
申请号 |
US201113324818 |
申请日期 |
2011.12.13 |
申请人 |
SATITPUNWAYCHA PETER;INTERMOLECULAR, INC. |
发明人 |
SATITPUNWAYCHA PETER |
分类号 |
H01J37/32;H01L21/31;H01L21/311 |
主分类号 |
H01J37/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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