发明名称 High density vertical structure nitride flash memory
摘要 A charge trap type of memory having a memory channel with vertical and possibly horizontal components is described. The invention includes a new operation method of simultaneous hole and electron injection operation for high speed and high reliability non-volatile memories, as well as high-density non-volatile memories. Array implementations for high-density memory arrays and high-speed memory arrays and their fabrication methods are also described.
申请公布号 US8710576(B2) 申请公布日期 2014.04.29
申请号 US20090378108 申请日期 2009.02.11
申请人 OGURA SEIKI;IWASAKI TOMOKO OGURA;OGURA NORI;HALO LSI INC. 发明人 OGURA SEIKI;IWASAKI TOMOKO OGURA;OGURA NORI
分类号 H01L29/792 主分类号 H01L29/792
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