发明名称 |
IC layout parsing for multiple masks |
摘要 |
A method for separating features in a target layout into different mask layouts for use in a photolithographic process. Features of a target layer are searched for features having a predefined shape. In one embodiment, portions of the feature having the predefined shape divided into two or more sub-features and at least one sub-feature are not considered when separating the features into two or more mask layouts. In another embodiment, features having a predefined shape are cut to form two or more sub-features and all features and sub-features are considered when separating the features of the target layout into the two or more mask layouts. |
申请公布号 |
US8713483(B2) |
申请公布日期 |
2014.04.29 |
申请号 |
US20070758510 |
申请日期 |
2007.06.05 |
申请人 |
TRITCHKOV ALEXANDER;SAHOURIA EMILE Y.;HONG LE;MENTOR GRAPHICS CORPORATION |
发明人 |
TRITCHKOV ALEXANDER;SAHOURIA EMILE Y.;HONG LE |
分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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