| 摘要 |
By providing a filter unit on a heater power feed line that electrically connects a heating element in a mounting table disposed in a processing vessel and a heater power supply disposed outside the processing vessel, influence on an electron density distribution on the mounting table or in-plane uniformity of process characteristics can be minimized. In a plasma processing apparatus, a heating element (50) provided in a susceptor (12) is electrically connected to a heater power supply (58(IN)) disposed outside a chamber (10) via an internal conductor (51) provided through the susceptor (12), a power feed conductor (52) provided across a space (SP), a filter unit (54) and an electric cable (56). A casing (110) of the filter unit (54) is vertically fastened, from a bottom of the chamber (10), to an opening (114) formed in a bottom wall (base) (10a) of the chamber (10) to be adjacent to a cylindrical conductive cover (42) that surrounds a power feed rod (40). The casing (110) is physically or electrically coupled to the bottom wall (10a) of the chamber (10). |
