| 发明名称 |
IN-SITU HYDROXYLATION SYSTEM |
| 摘要 |
Described are systems and methods for the hydroxylation of a substrate surface using ammonia and water vapor. |
| 申请公布号 |
KR20140050580(A) |
申请公布日期 |
2014.04.29 |
| 申请号 |
KR20137023334 |
申请日期 |
2012.02.03 |
| 申请人 |
APPLIED MATERIALS, INC. |
发明人 |
CHOI KENRIC;SATO TATSUYA E.;ULLOA ERNESTO |
| 分类号 |
H01L21/205;H01L21/02 |
主分类号 |
H01L21/205 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
