发明名称 |
MICROELECTRONIC SUBSTRATE CLEANING COMPOSITIONS HAVING COPPER/AZOLE POLYMER INHIBITION |
摘要 |
<p>Semi-aqueous, alkaline microelectronic cleaning composition of pH≧8 containing: (A) at least one secondary alkanolamine that generates hydroxides when in contact with water; (B) at least one organic alcohol ether solvent having an evaporation rate of 0.3 or less when n-butyl acetate's evaporation rate is taken as the baseline rate of 1.0; (C) at least one corrosion inhibiting cyclic amide compound; (D) at least one pH balancing azole metal corrosion inhibitor in an amount of 0.08% or less by weight of the composition; and (E) water; and optionally (F) at least one polyhydroxylated phenol compound corrosion inhibitor; and (G) at least one polyalcohol or polythiol surface modification agent containing vicinal hydroxyl or vicinal sulfhydryl groups to pair with the polyhydroxylated phenol compound corrosion inhibitor.</p> |
申请公布号 |
SG11201400840U(A) |
申请公布日期 |
2014.04.28 |
申请号 |
SG11201400840U |
申请日期 |
2012.10.05 |
申请人 |
AVANTOR PERFORMANCE MATERIALS, INC. |
发明人 |
HSU, CHIEN-PIN, SHERMAN |
分类号 |
C11D7/32 |
主分类号 |
C11D7/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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