发明名称 LIGHTING OPTICAL SYSTEM, EXPOSURE SYSTEM, AND DEVICE PRODUCTION METHOD
摘要 An Illumination optical apparatus that substantially maintains a desirable profile even when changing the outer shape of light intensity distribution formed on an illumination pupil plane with an axicon system. The illumination optical system illuminates an irradiated surface (M) based on light from an optical source (1) and includes a prism system, which changes the interval along an optical axis (AX) between a pair of prisms (6a, 6b) to change the light intensity distribution on an illumination pupil plane (8a).
申请公布号 KR101389669(B1) 申请公布日期 2014.04.28
申请号 KR20087018007 申请日期 2007.03.15
申请人 发明人
分类号 H01L21/027 主分类号 H01L21/027
代理机构 代理人
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