| 发明名称 |
DIFFUSION BARRIER AND METHOD OF FORMATION THEREOF |
| 摘要 |
<p>A method of forming a device is presented. The method includes providing a structure having first and second regions. A diffusion barrier is formed between at least a portion of the first and second regions. The diffusion barrier comprises cavities that reduce diffusion of elements between the first and second regions.</p> |
| 申请公布号 |
SG2014012983(A) |
申请公布日期 |
2014.04.28 |
| 申请号 |
SG20140012983 |
申请日期 |
2009.06.12 |
| 申请人 |
GLOBALFOUNDRIES SINGAPORE PTE. LTD. |
发明人 |
TAN SHYUE SENG;TEO LEE WEE;CHONG YUNG FU;ELGIN QUEK;SANFORD CHU |
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