EDDC FLUX PINNING POINTS FORMED USING A HYBRID SPUTTERING DEVICE

摘要

The present invention relates to a device to form flux pinning points of an EDDC using a hybrid sputtering device comprising: a sputtering chamber connected to a vacuum pump to make the internal space in a vacuum state; a superconductive substance supply part arranged inside the sputtering chamber to supply high-temperature superconductive substances; a reaction chamber connected to the upper part of the sputtering chamber to be communicated, and having a substrate-wound drum arranged therein to be rotated so that a substrate can be exposed to the sputtering chamber due to the rotation of the drum to thermally treat the substrate sputtered by the superconductive substance supply part; and a flux pinning point supply part having a sputtering gun arranged inside the reaction chamber to sputter flux pinning point substances on the substrate.