<p>According to an embodiment of the present invention, a semiconductor device can include a source electrode which is formed on one side of an N-type AlGaN layer; an N-type and P-type AlGaN layer which is formed on the other side of a P-type AlGaN layer and is formed in a direction orthogonal to the source electrode; a gate electrode which is formed on one side of the N-type and P-type AlGaN layer; and a drain electrode which is formed on the other side of the N-type and P-type AlGaN layer.</p>
申请公布号
KR101388721(B1)
申请公布日期
2014.04.25
申请号
KR20120119857
申请日期
2012.10.26
申请人
SAMSUNG ELECTRO-MECHANICS CO., LTD.
发明人
PARK, JAE HOON;SONG, IN HYUK;SEO, DONG SOO;KIM, KWANG SOO;UM, KEE JU