发明名称 SEMICONDUCTOR DEVICE
摘要 <p>According to an embodiment of the present invention, a semiconductor device can include a source electrode which is formed on one side of an N-type AlGaN layer; an N-type and P-type AlGaN layer which is formed on the other side of a P-type AlGaN layer and is formed in a direction orthogonal to the source electrode; a gate electrode which is formed on one side of the N-type and P-type AlGaN layer; and a drain electrode which is formed on the other side of the N-type and P-type AlGaN layer.</p>
申请公布号 KR101388721(B1) 申请公布日期 2014.04.25
申请号 KR20120119857 申请日期 2012.10.26
申请人 SAMSUNG ELECTRO-MECHANICS CO., LTD. 发明人 PARK, JAE HOON;SONG, IN HYUK;SEO, DONG SOO;KIM, KWANG SOO;UM, KEE JU
分类号 H01L29/778;H01L21/335 主分类号 H01L29/778
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