发明名称 TARGET MATERIAL SUPPLY APPARATUS FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE
摘要 A target material supply apparatus for an extreme ultraviolet (EUV) light source includes a tube that includes a first end, a second end, and a sidewall defined between the first and second ends. At least a portion of an outer surface of the tube includes an electrically insulating material, the first end receives a pressurized target material, and the second end defines an orifice through which the pressurized target material passes to produce a stream of target material droplets, The target material supply apparatus also includes an electrically conductive coating on the outer surface of the tube. The coating is configured to electrically connect the outer surface of the tube to ground to thereby reduce surface charge on the outer surface.
申请公布号 WO2014062351(A2) 申请公布日期 2014.04.24
申请号 WO2013US61764 申请日期 2013.09.25
申请人 CYMER, LLC 发明人 DE DEA, SILVIA;VASCHENKO, GEORGIY, O.;BAUMGART, PETER, M.;BOWERING, NORBERT, R.
分类号 F16L9/14;C23C14/34;C23C14/35;H05G2/00 主分类号 F16L9/14
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