DRY ETCHING APPARATUS AND METHOD OF DRY ETCHING USING THE SAME

摘要

The present invention relates to a dry etching device and a dry etching method using the same to secure a uniform removal rate for organic matters and pollutants from the surface of a substrate by maintaining the pressure of all sectors; and uniformly injecting a gas into an etching chamber for an etching process using a ring-shaped gas flow passage satisfying choke flow conditions and an adaptor ring comprising multiple orifices.