| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a mask blank and a transfer mask, by which generation of a fine defect in a resist film, particularly, generation of a defect caused by fine bubbles can be suppressed in a resist application step for forming a resist film.SOLUTION: The method for manufacturing a mask blank includes a resist application step including a dropping step of dropping a resist solution. When a rotational speed of a substrate, a start time of dropping the resist solution and a termination time of dropping the resist solution are denoted by R(t), tand t, respectively, the rotational speed R(t) varies, in a time range represented by t≤t≤t, to satisfy: (1) a relationship of R(t)<R(t); (2) a relationship of R(t)≤R(t) (t<t) in a period from tto the time when the rotational speed reaches R(t); (3) a relationship of 0≤R(t)<700 rpm; and (4) a condition that a time period from tto the time when the rotational speed reaches R(t) is 0.1 sec or more. |
