| 摘要 |
PROBLEM TO BE SOLVED: To provide a continuous plating treatment method capable of conducting plating treatment while changing a set current value for each workpiece.SOLUTION: When the number of the workpieces simultaneously transferrable in a plating tank in a completely immersed state is N, (N+1) cathode relay members that extend in a workpiece transfer direction and (N+1) power supply units are provided outside the plating tank, anode terminals of the respective power supply units are connected to the anode electrodes oppositely disposed inside the plating tank, and cathode terminals of the power supply units are respectively connected to the cathode relay members. A continuous plating treatment device is formed such that: power is supplied to each of the workpieces being transferred in the plating tank, from a corresponding power supply unit through a corresponding cathode relay member; and the power supply units are able to be controlled by constant current control when being transferred in a completely immersed state, and by current gradual increase control when being carried into the plating tank in a partially immersed state and by current gradual decrease control when being carried out from the plating tank in a partially immersed state. |
