发明名称 |
METHOD FOR PREPARING SILICON OXIDE |
摘要 |
The present invention relates to a method for preparing silicon oxide capable of controlling the amount of oxygen in silicon oxide, comprising: mixing silicon and silicon dioxide to provide the mixture in a reaction chamber; and reducing the pressure of the reaction chamber to a high vacuum degree while increasing the internal temperature of the reaction chamber to a reaction temperature, wherein the mixture of silicon and silicon dioxide is reacted in the reductive atmosphere. |
申请公布号 |
WO2014061973(A1) |
申请公布日期 |
2014.04.24 |
申请号 |
WO2013KR09211 |
申请日期 |
2013.10.15 |
申请人 |
LG CHEM, LTD. |
发明人 |
JUNG, SANG YUN;JEONG, HAN NAH;PARK, CHEOL HEE;KIM, HYUN CHUL;LIM, BYUNG KYU |
分类号 |
C01B33/113;H01M4/48;H01M10/05 |
主分类号 |
C01B33/113 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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