| 摘要 |
<p>A process for producing a permanent film for optical materials, the process comprises exposing a photosensitive resin composition to light to cure the exposed areas and thereafter removing the unexposed areas to leave the cured film as a permanent film, wherein the photosensitive resin composition comprises (A) a polymerizable monomer, (B) a photopolymerization initiator, (C) an alkali-soluble resin, and (D) a solvent. In the process, the photosensitive resin composition is irradiated with active radiation selected from g-line, h-line, and i-line through a half-tone phase shift mask in which the phase shifter part has a transmittance of 0.1-20%, thereby exposing the resin to the light.</p> |
