PHOTOMASK, TFT GLASS SUBSTRATE AND MANUFACTURING METHOD THEREOF

摘要

A photomask (200) is used for partially blocking ultraviolet light in the exposure step (S140) during producing the TFT substrate (20). The photomask comprises a panel pattern forming area (210) and an additional pattern forming area (220). The panel pattern forming area is used for forming a panel pattern (21). The additional pattern forming area is at the edge of the panel pattern forming area and used for forming an additional pattern (22) at the edge of the panel pattern. During the process for producing the TFT substrate, the photomask is used to add an additional pattern at the edge of the panel pattern in the exposure step (S140). Good uniformity between the microstructure character at the edge of the panel pattern and the microstructure character in the middle of the panel pattern can be ensured.