| 摘要 |
The disclosed device has a ring shaped O-ring (29a), which is between a dielectric plate (28) and a support unit (13a) on a lid member (13), and has a spacer (60) which forms a gap (d), on the outer peripheral side of the O-ring (29a), between the dielectric plate (28) and the support unit (13a) of the lid member (13), the lid member being arranged above a processing container (1). Due to the gap (d), the lid member (13) and the dielectric plate (28) do not come into contact and become worn, even if the lid member (13) and the dielectric plate (28) thermally expand due to the heat of the plasma within the processing container (1), thus damage to the dielectric plate (28) and the generation of particles can be prevented. |
