PATTERN INSPECTING AND MEASURING DEVICE AND PROGRAM

摘要

The purpose of the present invention is to provide a pattern inspecting and measuring device that improves the reliability of inspection and measurement results by reducing the effect of noise or the like on inspections or measurements using an edge position extracted from image data obtained by imaging the pattern of an object to be inspected or measured. To this end, a pattern inspecting and measuring device, which inspects or measures a pattern to be inspected or measured by using an edge position extracted from image data obtained by imaging a pattern to be inspected or measured by using an edge extraction parameter, is characterized by generating the edge extraction parameter by using the image data and a reference pattern indicating the shape that is the reference for inspection or measurement.