发明名称 FLUORINATED MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
摘要 A fluorinated monomer has formula (1) wherein R1 is H, F, methyl or trifluoromethyl, R2 and R3 are H or a monovalent hydrocarbon group, R4 to R6 each are a monovalent fluorinated hydrocarbon group, A is a divalent hydrocarbon group, and k1 is 0, 1 or 2. A polymer derived from the fluorinated monomer may be endowed with appropriate water repellency, water slip, acid lability and hydrolysis and is useful as an additive polymer in formulating a resist composition.
申请公布号 US2014114080(A1) 申请公布日期 2014.04.24
申请号 US201314142588 申请日期 2013.12.27
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 SAGEHASHI MASAYOSHI;HASEGAWA KOJI;SASAMI TAKESHI
分类号 C07D317/34;C07D317/72 主分类号 C07D317/34
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