PHOTOMASK, PHOTOMASK SET, EXPOSURE APPARATUS AND EXPOSURE METHOD

摘要

PROBLEM TO BE SOLVED: To provide a photomask capable of improving alignment accuracy with respective photomasks disposed on the front and rear faces of a substrate.SOLUTION: A photomask 70 includes: a drawing pattern 73 for exposure formed on one face opposing a substrate P; a first alignment mark TM1 for alignment with a substrate-side mark P5 formed on the substrate P, the first alignment mark being provided in a region of the one face where the drawing pattern 73 is not formed, the region opposing the substrate P when the substrate is retained; and a second alignment mark TM for alignment with a third alignment mark TM3 provided on another photomask 70, the second alignment mark being provided in a region which does not oppose the substrate P when the substrate P is retained.