发明名称 NONVOLATILE MEMORY ELEMENT AND MANUFACTURING METHOD OF THE NONVOLATILE MEMORY ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a nonvolatile memory element capable of initial breakdown by applying a lower voltage.SOLUTION: The nonvolatile memory element comprises: a first electrode 105; a second electrode 107; and a resistance change layer 106 which is formed being interposed between the first electrode 105 and the second electrode 107 and constituted of at least two layers of a first resistance change layer 1061 and a second resistance change layer 1062, in which the resistance value reversibly changes based on an electric signal. The first resistance change layer 1061 is formed of a metal oxide 106a. The second resistance change layer 1062 comprises: a first portion formed in a uniform plane; and a second portion formed of insulator 106c and formed in a uniform plane. The oxygen-deficient rate of the first portion is smaller than that of a metal oxide 106a, and entire of the first portion being disposed in a uniform plane region of a metal oxide 106b. Each of the first portion and the second portion of the second resistance change layer 1062 are in contact with a portion of a main plane of the first resistance change layer 1061 and the second resistance change layer 1062.
申请公布号 JP2014075576(A) 申请公布日期 2014.04.24
申请号 JP20130167082 申请日期 2013.08.09
申请人 PANASONIC CORP 发明人 YONEDA SHINICHI
分类号 H01L27/105;H01L45/00;H01L49/00 主分类号 H01L27/105
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