FILM FORMATION DEVICE, AND FILM FORMATION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a film formation device that can form a film on a substrate, or to provide a film formation method that can form a film on the substrate.SOLUTION: A film formation device comprises: a supporting member supporting a substrate; and a plurality of nozzles provided so as to be adjacent to the supporting member and so as to be separated from each other. In addition, the plurality of nozzles blow out a vaporized material to form a part where the material is deposited and a part where no material is deposited.