发明名称 ELECTROLYTIC COPPER PLATING SOLUTION, AND METHOD OF ELECTROLYTIC COPPER PLATING
摘要 PROBLEM TO BE SOLVED: To provide an electrolytic copper plating solution excellent in via filling ability without using formaldehyde which is harmful to the environment.SOLUTION: The electrolytic copper plating solution contains compounds which have a -X-S-Y- structure where X and Y are individually atoms selected from the group consisting of hydrogen, carbon, sulfur, nitrogen, and oxygen atoms, and X and Y can be the same only when they are carbon atoms, and specific urea derivatives. Good filled vias can be made without causing worsening of the exterior appearance of plating using this electrolytic copper plating solution.
申请公布号 JP2014074205(A) 申请公布日期 2014.04.24
申请号 JP20120222342 申请日期 2012.10.04
申请人 ROHM & HAAS DENSHI ZAIRYO KK 发明人 SAITO MUTSUKO;SAKAI MAKOTO;MIZUNO YOKO;MORINAGA TOSHIYUKI;HAYASHI SHINJIRO
分类号 C25D3/38;C25D7/00;H05K3/18 主分类号 C25D3/38
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