发明名称 |
ION IMPLANTER POWER SUPPLY WHICH IS INTENDED TO LIMIT THE LOADING EFFECT |
摘要 |
The invention relates to a power supply ALT for an ion implanter, the power supply comprising: an electricity generator SOU placed between a substrate-carrier tray PPS and ground E, and a capacitor CDS in a parallel branch likewise connected between the substrate-carrier tray PPS and ground E. The capacitor CDS has a capacitance of less than 5 nF. The invention also provides an ion implanter incorporating the power supply. |
申请公布号 |
US2014110607(A1) |
申请公布日期 |
2014.04.24 |
申请号 |
US200514007099 |
申请日期 |
2005.06.14 |
申请人 |
TORREGROSA FRANK;GILLES MATHIEU;ION BEAM SERVICES |
发明人 |
TORREGROSA FRANK;GILLES MATHIEU |
分类号 |
H03H7/06;H01J37/02;H01J37/317;H01J37/32 |
主分类号 |
H03H7/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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